All in one DLI system
．multi-process capability in the same chamber
- Simple and multi-metallic oxides
- Metals, nitrides and alloys
- III-V, wide band gap semiconductors
- 2D and 3D materials
The Annealsys MC-050 system is a 2-inch DLI-CVD / DLI-ALD reactor developed to meet the requirements of research and development units.
The infrared lamp furnace in association with the direct liquid injection vaporizers provide unique multi process capabilities inside the same process chamber: CVD, ALD, MOCVD, RTP and RTCVD.
The Direct Liquid Injection (DLI) vaporizers provide perfect control of precursor flow and allow utilization of low vapor pressure and diluted chemical precursors. The fast switching of the precursor vapor flows associated with the by-pass valve provide perfect interface control for deposition of nanolaminates.
The MC-050 is the perfect machine for the development of new materials and nanolaminates using the widest range of solid and liquid organometallic precursors.
- Temperature range: RT to 1100°C
- Gas mixing capability with mass flow controllers
- Up to 6 vaporizers
- Vacuum range: Atmosphere to 10^-3 Torr
- Glove box loading option
- High vacuum capability in option
- Pyrometer temperature control
- Rough vacuum pump, Turbo pump
- Glove box interface and glove box
- Remote plasma
- Ozone generator
※※ Product brochure: https://www.annealsys.com/Annealsys-MC-050.pdf