Measurement Service

The film penetration depth profile is a unique experimental data enabled by the Lateral High Aspect Ratio (LHAR) test structures. It is obtained by measuring film thickness as a function of depth distance at the LHAR trench.The penetration depth profile enables to quantify film conformality and extract various reaction kinetics factors.

Chipmetrics measurement service includes SAMPLE MEASUREMENT BY LINE-SCAN REFLECTOMETRY , Scanning Electron Microscope (SEM), and imaging ellipsometer.

Website
https://chipmetrics.com/

























































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Atomic Layer Deposition (ALD)
High Aspect Ratio
ALD Deposition
Conformal Coating
ALD Process
Thin Film Deposition
Film Uniformity
ALD Thickness Control
High Aspect Ratio Structures
Nano-scale Deposition
ALD Surface Chemistry
ALD Precursors
ALD Monitoring
Metrology for ALD
Film Conformality
Aspect Ratio Dependent Etching
ALD Growth Mechanisms
SEM
FIB
ASD (Area Selective Depostion)
ALE (Atomic Layer Etching)

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