Products & Service
VHAR1
VHAR1
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Chipmetrics VHAR1 silicon test chip consists an array of vertical high aspect ratio holes.
The holes have a constant hole diameter of 1 µm, and depth of 200 µm over the whole chip area 15 × 15 mm.
The measurement of the deposited film penetration depth profile can be achieved by cross-sectioning as normally done with the vertical high aspect ratio test structures.
Website
https://chipmetrics.com/
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Atomic Layer Deposition (ALD)
High Aspect Ratio
ALD Deposition
Conformal Coating
ALD Process
Thin Film Deposition
Film Uniformity
ALD Thickness Control
High Aspect Ratio Structures
Nano-scale Deposition
ALD Surface Chemistry
ALD Precursors
ALD Monitoring
Metrology for ALD
Film Conformality
Aspect Ratio Dependent Etching
ALD Growth Mechanisms
SEM
FIB
ASD (Area Selective Depostion)
ALE (Atomic Layer Etching)
Detail Specification