Pillar Hall

PillarHall® LHAR4 silicon test chip contains Lateral High Aspect Ratio (LHAR) test structures for ALD and CVD thin film characterization.

It is used as a measurement tool for thin film conformality and side wall coverage measurements in a high aspect ratio trench.

PillarHall’s innovative approach reduces measurement costs by eliminating the need for destructive sample preparation, special analytical tools, specialist users, and special expensive services.

Website
https://chipmetrics.com/

























































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Atomic Layer Deposition (ALD)
High Aspect Ratio
ALD Deposition
Conformal Coating
ALD Process
Thin Film Deposition
Film Uniformity
ALD Thickness Control
High Aspect Ratio Structures
Nano-scale Deposition
ALD Surface Chemistry
ALD Precursors
ALD Monitoring
Metrology for ALD
Film Conformality
Aspect Ratio Dependent Etching
ALD Growth Mechanisms
SEM
FIB
ASD (Area Selective Depostion)
ALE (Atomic Layer Etching)

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