SprayCVD-050
SprayCVD-050
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Specification:
The Annealsys SprayCVD-050 is a 2-inch aerosol CVD reactor especially developed to meet the requirements of research and development units. The system can accommodate substrates up to 2”x2”. The infrared lamp heating system provides in-situ rapid thermal annealing process capability inside the deposition chamber. The system can be equipped with Kemstream Atokit for the precursor atomization and spray generation. The system has vacuum capability and gas mixing capability. The Spray CVD tool is fully computer controlled for easy utilization and data logging. The software is Windows compatible.
Detail Specification
spec. table
Applications | Spray-CVD, RTA, RTO, In-situ annealing capability |
Substrate size | up to 2-inch diameter |
Temperature max. | 1200°C |
Temperature ramp rate | 200°C/s on 2-inch silicon wafer |
Temperature control | thermocouple (optional pyrometer) , fast PID |
Vacuum capability | 10-3 Torr |
Gas lines | up to 3 gas lines with MFC and one purge line with needle valve |
Loading | manual, optional interface for glove-box |
Maximum substrate size |
2-inch x 2-inch |
Process chamber |
Quartz tube with stainless steel flanges |
Heating |
Halogen lamps Optional top or/and bottom source heating |
Temperature control |
Thermocouple temperature control Fast digital PID temperature controller |
Vacuum, gas and liquid |
Purge gas line with needle valve Up to 3 process gas lines with mass flow controllers Kemstream Atokit for precursor atomization Vacuum valve and vacuum gauge Optional vacuum rotary pump Optional pressure control with throttle valve |
Control |
Full PC control |
Facilities |
Electricity: 3x400V+N+Gr or 3x220V+Gr, 50/60 Hz Power: 15 kW Water: 2 to 6 bars, pressure drop 1 bar, 8 l/mn Compressed air: 6 bars (valve actuation, low consumption) Process gas fittings: Swagelok ¼ |
Dimensions and weight |
Width: 700 mm Depth: 700 mm Height: 700 mm Weight: 90 kg |