• Product Type:
  • Specification:

    The Annealsys MC050 is a 2-inch multi process system (DLI-CVD, DLI-ALD, MOCVD, RTP and RTCVD) offering the widest capabilities for development of new materials.

    The Direct Liquid Injection (DLI) vaporizers provide perfect control of precursor flow and allows utilization of low vapor pressure and diluted chemical precursors. The fast switching of the precursor vapor flows associated with the by-pass valve provided perfect interface control for deposition of nanolaminates.

    The lamp heating system of the process chamber allows doing in-situ annealing before and after the deposition as well as infrared assisted CVD and ALD processes.

    The automated liquid panel has been optimized for reduced consumption of chemical precursors. The no dead volume design provides full rising capability for easy change of chemicals and refilling of the precursor tanks in a glove box.

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Detail Specification


Maximum substrate diameter

2-inch (51 mm)

Process chamber

Quartz tube with water-cooled stainless steel flanges


Halogen lamps

Temperature control

Thermocouple temperature control



Optional pyrometer temperature control

Digital PID temperature controllers

Vacuum, gas and liquid


Up to 8 process gas lines with mass flow controllers

Up to 6 vaporizer units selected function of liquid precursors

Additional ALD kit for water

Automated liquid panel for easy precursor handling

Vacuum valve, vacuum gauge and purge gas line

By-pass vacuum valve

Pressure control with throttle valve

Optional vacuum rotary pump

Optional turbo pump


Full PC control


Electricity: 3x400V+N+Gr or 3x220V+Gr, 50/60 Hz

Power: 20 kW

Water: 2 to 6 bars, pressure drop 1 bar, 8 l/mn

Compressed air: 6 bars (valve actuation)

Process gas fittings: Swagelok ¼ (Optional VCR)

Dimensions and weight

Width: 955 mm

Depth: 1604 mm

Height: 1812 mm

Weight: 400 kg






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