產品介紹

PRODUCT

產品介紹

LC Series

LC 100/102

LC Series

  • 產品型式:
  • - LC100系列為應用於LPCVD的4"精簡管式爐管,主要用於研發及小量生產,可最大裝載至每批量50片晶圓

    - 製程腔為不銹鋼法蘭之石英管,石英晶舟由入口的二根石英棒所支撐,搭配高品質、低熱容量的加熱元件,提供快速的熱反應

    - 高品質的數位溫度控制器可分別控制每個加熱區,隨溫度變化,該控制器可利用其自動調控(Auto-tuning)功能,持續隨製程變化而進行參數調整,提供高精密度及高再現性的加熱製程

    - 此系統搭載一排氣管路,並可接收最高達12管的流量控制製程氣體

    - 包含單一腔體(LC100)及雙腔體(LC102)二種機台架構

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詳細說明

規格表格:

 

Applications LPCVD, Annealing, Oxidation…
Substrate size up to 4-inch diameter
Temperature max. 1100°C
Temperature control 3 zones, thermocouple, PID control
Vacuum capability 10-3 Torr (option: 10-6 Torr)
Gas lines up to 12 gas lines with MFC, one purge line with needle valve
Loading manual batch (up to 50 wafers per process) 
Number of process tubes 1 or 2

 

Maximum substrate diameter

   Four inch

Process chamber

   Quartz tube with water-cooled stainless steel flanges

Heating

   Low thermal inertia resistor furnace

   Maximum temperature 1000°C or 1100°C

Temperature control

   Thermocouple temperature control

   Digital PID temperature controller – 3 zones

Vacuum and gas

   Purge gas line with needle valve

   Up to 12 process gas lines with digital mass

   flow controllers

   Vacuum valve and vacuum gauge

   Optional vacuum rotary of dry pump

   Optional pressure control with throttle valve

   Option turbo pump

Control

   PC control

Facilities

   Electricity: 3x400V+N+Gr or 3x220V+Gr, 50/60 Hz

   Power: 15 kW (1 tube) or 30 kW (2 tubes)

   Water: 2 to 6 bars, pressure drop 1 bar, 8 l/mn

   Compressed air: 6 bars (valve actuation)

   Process gas fittings: VCR ¼

Dimensions and weight

   Width: 700 mm

   Depth: 1700 mm

   Height: 1500 mm

   Weight: 600 kg


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