產品介紹

PRODUCT

產品介紹

MC200

MC200

  • 產品型式:
  • 特性說明:

    Annealsys MC200為一200mm反應腔壁具熱控制薄膜沉積製程系統,可廣泛應用於DLI-CVD and DLI-ALD製程。

    Direct Liquid Injection (DLI)汽化器提供先驅物(precursors)良好的控制並可使用低壓與稀釋的化學先驅物。汽化先驅物可由旁通閥快速切換提供薄膜沉積物良好的控制。

    可選用電容電漿以提供具PE-CVD與PE-ALD能力來降低薄膜沉積時溫度。

    反應腔熱控制壁提供先驅物更有效地使用,並可限制薄膜沉積物於製程腔體壁上生成。自動液體流量控制板可自動調整先驅物的使用量而使之最佳化。無死角的容器設計提供化學品更快速地更換與填充。

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詳細說明

規格表格:

Maximum substrate size

200 mm

Process chamber

Stainless steel with thermally controlled walls

Rotating substrate holder

Heating

Resistor heating up to 850°C

Temperature control

Thermocouple temperature control

Digital PID temperature controllers

Vacuum, gas and liquid

Purge gas line with needle valve

Up to 8 process gas lines with mass flow controllers

Up to 4 vaporizer units selected function of liquid precursors

Additional ALD kits

Custom liquid panel depending on the application

Vacuum valve and vacuum gauge

Optional vacuum rotary of dry pump

Control

Full PC control

Facilities

Electricity: 3x400V+N+Gr or 3x220V+Gr, 50/60 Hz

Power: 20 kW

Water: 2 to 6 bars, pressure drop 1 bar, 10 l/mn

Compressed air: 6 bars (valve actuation)

Process gas fittings: VCR ¼

Dimensions and weight

Width: 1405 mm

Depth: 1504 mm

Height: 2200 mm

Weight: 1000 kg


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