MC050
MC050
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特性說明:
Annealsys MC050為一2”多功能薄膜沉積製程系統(DLI-CVD, DLI-ALD, MOCVD, RTP and RTCVD),提供廣泛地新材料開發研究。
Direct Liquid Injection (DLI)汽化器提供先驅物(precursors)良好的控制並可使用低壓與稀釋的化學先驅物。汽化先驅物可由旁通閥快速切換提供薄膜沉積物良好的控制。
製程腔體燈源加熱系統可在薄膜沉積製程前後直接做退火製程。自動液體流量控制板可自動調整先驅物的使用量而使之最佳化。無死角的容器設計提供化學品更快速地更換與填充。
製品概要
Maximum substrate diameter |
2-inch (51 mm) |
Process chamber |
Quartz tube with water-cooled stainless steel flanges |
Heating |
Halogen lamps |
Temperature control |
Thermocouple temperature control |
|
Optional pyrometer temperature control Digital PID temperature controllers |
Vacuum, gas and liquid
|
Up to 8 process gas lines with mass flow controllers Up to 6 vaporizer units selected function of liquid precursors Additional ALD kit for water Automated liquid panel for easy precursor handling Vacuum valve, vacuum gauge and purge gas line By-pass vacuum valve Pressure control with throttle valve Optional vacuum rotary pump Optional turbo pump |
Control |
Full PC control |
Facilities |
Electricity: 3x400V+N+Gr or 3x220V+Gr, 50/60 Hz Power: 20 kW Water: 2 to 6 bars, pressure drop 1 bar, 8 l/mn Compressed air: 6 bars (valve actuation) Process gas fittings: Swagelok ¼ (Optional VCR) |
Dimensions and weight |
Width: 955 mm Depth: 1604 mm Height: 1812 mm Weight: 400 kg |