• Product Type:
  • Specification:

    The Annealsys MC100 is a 100 mm DLI-CVD and DLI-ALD system designed for research and development applications. It offers the capability to deposit a wide range of materials with low cost of ownership.

    The Direct Liquid Injection (DLI) vaporizers provide perfect control of precursor flow and allows utilization of low vapor pressure and diluted chemical precursors. The fast switching of the precursor vapor flows associated with the by-pass valve provided perfect interface control for deposition of nanolaminates.

    The thermally controlled wall reactor provides efficient utilization of the chemical precursor and limited deposition on the process chamber walls. The automated liquid panel has been optimized for reduced consumption of chemical precursors. The no dead volume design provides full rising capability for easy change of chemicals and refilling of the precursor tanks in a glove box.

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Detail Specification

Spec. table:


Maximum substrate diameter


Process chamber

Stainless steel with thermally controlled walls

Rotating substrate holder


Resistor heating up to 850°C

Temperature control

Thermocouple temperature control

Digital PID temperature controllers

Vacuum, gas and liquid

Up to 8 process gas lines with mass flow controllers

Up to 4 vaporizer units selected function of liquid precursors

Additional ALD kit for water

Automated liquid panel for easy precursor handling

Vacuum valve, vacuum gauge and purge gas line

By-pass vacuum valve

Pressure control with throttle valve

Optional vacuum rotary pump


Full PC control


Electricity: 3x400V+N+Gr or 3x220V+Gr, 50/60 Hz

Power: 12 kW

Water: 2 to 6 bars, pressure drop 1 bar, 4 l/mn

Compressed air: 6 bars (valve actuation)

Process gas fittings: Swagelok ¼ (VCR ¼ optional)

Dimensions and weight

Width: 1100 mm

Depth: 1450 mm

Height: 2000 mm

Weight: 800 kg









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